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Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process
Fan, Ching-Lin, Shang, Ming-Chi, Li, Bo-Jyun, Lin, Yu-Zuo, Wang, Shea-Jue, Lee, Win-Der, Hung, Bohr-RanVolume:
8
Language:
english
Journal:
Materials
DOI:
10.3390/ma8041704
Date:
April, 2015
File:
PDF, 916 KB
english, 2015