Investigation of Surface Roughness on Platinum Deposited Wafer after Reactive Ion Etching Using SF6+Argon Gaseous
Sauli, Zaliman, Retnasamy, Vithyacharan, Yeow, Aaron Koay Terr, Chui, Goh Siew, Anwar, K., Abdullah, NooraihanVolume:
487
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/amm.487.210
Date:
January, 2014
File:
PDF, 322 KB
english, 2014