Silicon Etching in CF4/O2 and SF6 Atmospheres

Materials Science Forum 2004 Vol. 455-456

Silicon Etching in CF4/O2 and SF6 Atmospheres

Silva, A., Raniero, Leandro, Ferreira, E., Águas, Hugo, Pereira, Luís, Fortunato, Elvira, Martins, Rodrigo
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Volume:
455-456
Year:
2004
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.455-456.120
File:
PDF, 336 KB
english, 2004
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