Atomic layer deposition TiO2 coated porous silicon surface:...

Thin Solid Films 2015 / 08 Vol. 589

Atomic layer deposition TiO2 coated porous silicon surface: Structural characterization and morphological features

Iatsunskyi, Igor, Jancelewicz, Mariusz, Nowaczyk, Grzegorz, Kempiński, Mateusz, Peplińska, Barbara, Jarek, Marcin, Załęski, Karol, Jurga, Stefan, Smyntyna, Valentyn
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Volume:
589
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.05.056
Date:
August, 2015
File:
PDF, 1.87 MB
english, 2015
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