Silicon oxide particle formation in RF plasmas investigated...

Journal of Physics D Applied Physics 1998 / 01 Vol. 31; Iss. 1

Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry

Hollenstein, Ch, Howling, A A, Courteille, C, Magni, D, Scholz, S M, Kroesen, G M W, Simons, N, Zeeuw, W de, Schwarzenbach, W
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Volume:
31
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/31/1/011
Date:
January, 1998
File:
PDF, 370 KB
english, 1998
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