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Study of Thermal Stability of HfO[sub x]N[sub y]∕Ge Capacitors Using Postdeposition Annealing and NH[sub 3] Plasma Pretreatment
Cheng, Chao-Ching, Chien, Chao-Hsin, Luo, Guang-Li, Yang, Chun-Hui, Kuo, Mei-Ling, Lin, Je-Hung, Tseng, Chih-Kuo, Chang, Chun-YenVolume:
154
Year:
2007
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2734875
File:
PDF, 899 KB
english, 2007