Impact of Sputter Deposition Parameters on the Leakage Current Behavior of Aluminum Nitride Thin Films
Schneider, Michael, Strunz, Tobias, Bittner, Achim, Schmid, UlrichVolume:
77
Language:
english
Journal:
Advances in Science and Technology
DOI:
10.4028/www.scientific.net/AST.77.29
Date:
September, 2012
File:
PDF, 1.08 MB
english, 2012