Plasma Enhanced Chemical Vapor Deposition and...

Materials Science Forum 2000 Vol. 338-342

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Yi Hua, Lin, Jian Yi, Feng, Zhe Chuan, Chua, Soo Jin, Alfred, Cheng Hon Huan
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Volume:
338-342
Year:
2000
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.338-342.325
File:
PDF, 361 KB
english, 2000
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