Effect of Nitrogen Flow Rate on the Structure and Properties of TiN Thin Films Deposited onto β-Type Ti-15Mo-3Nb-3Al-0.2Si Alloy Substrates by Reactive Magnetron Sputtering
Lee, Jun Hee, Nathanael, A. Joseph, Hong, Sun IgVolume:
557-559
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.557-559.1998
Date:
July, 2012
File:
PDF, 876 KB
english, 2012