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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - H 2 plasma and neutral beam treatment of EUV photoresist
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, De Schepper, P., Marinov, D., el Otell, Z., Altamirano-Sánchez, E., de Marneffe, J.-F., De Gendt, S., Braithwaite, N. St. J.Volume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2085679
File:
PDF, 988 KB
english, 2015