SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns
Resnick, Douglas J., Bencher, Christopher, Nation, Benjamin D., Peters, Andrew, Lawson, Richard A., Ludovice, Peter J., Henderson, Clifford L.Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085526
File:
PDF, 1.53 MB
english, 2015