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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Observing morphology on surface of poly(methacrylate) in ArF lithography using AFM phase image
Matsunaga, Shuji, Aratani, Ichihiro, Okabe, Fumihiko, Kitayama, Masahiko, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711392
File:
PDF, 370 KB
english, 2007