ARCHIVE Proceedings of the Institution of Mechanical Engineers Part B Journal of Engineering Manufacture 1989-1996 (vols 203-210)
2009 / 2 Vol. 223; Iss. 2
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Line segment fabrication model analysis of near-field photolithography
Lin, Z-C, Yang, C-BVolume:
223
Language:
english
Journal:
Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture
DOI:
10.1243/09544054jem1210
Date:
February, 2009
File:
PDF, 429 KB
english, 2009