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Effects of Carbon Co-Implantation on Transient Enhanced Diffusion and Performances of the Phosphorus Doped Ultra-Shallow Junction Nano NMOSFET
Chiu, Hung Yu, Fang, Yean Kuen, Juang, Feng RennVolume:
284-287
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/amm.284-287.98
Date:
January, 2013
File:
PDF, 340 KB
english, 2013