Feasibility to Fabricate the 45° Slant with Anisotropic...

Advanced Materials Research 2012 / 4 Vol. 503-504

Feasibility to Fabricate the 45° Slant with Anisotropic Silicon Etching in NaOH Solution

Limcharoen, Alonggot, Pakpum, Chupong, Limsuwan, Pichet
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Volume:
503-504
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.503-504.615
Date:
April, 2012
File:
PDF, 575 KB
english, 2012
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