Effect of Salty Development on Forming HSQ Resist Nanodot...

Key Engineering Materials 2013 / 1 Vol. 534

Effect of Salty Development on Forming HSQ Resist Nanodot Arrays with a Pitch of 15×15 nm2 by 30-keV Electron Beam Lithography

Komori, Takuya, Zhang, Hui, Akahane, Takashi, Mohamad, Zulfakri, Yin, You, Hosaka, Sumio
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Volume:
534
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/kem.534.113
Date:
January, 2013
File:
PDF, 595 KB
english, 2013
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