Stress Relaxation Mechanism by Strain in the Si-SiO2 System and its Influence on the Interface Properties
Kropman, Daniel, Mellikov, Enn, Kärner, Tiit, Laas, Tõnu, Medvid, Arthur, Onufrijevs, Pavels, Dauksta, EdvinsVolume:
178-179
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/ssp.178-179.259
Date:
August, 2011
File:
PDF, 1.27 MB
english, 2011