Grain size and stoichiometry control over RF-sputtered...

Thin Solid Films 2015 / 08 Vol. 589

Grain size and stoichiometry control over RF-sputtered multiferroic BiFeO3 thin films on silicon substrates

Drera, Giovanni, Giampietri, Alessio, Alessandri, Ivano, Magnano, Elena, Bondino, Federica, Nappini, Silvia
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Volume:
589
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.06.030
Date:
August, 2015
File:
PDF, 1.50 MB
english, 2015
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