[ECS 213th ECS Meeting - Phoenix, AZ (May 18 - May 23, 2008)] ECS Transactions - Application Of HCl Gas Phase Etch In The Production Of Novel Devices
Hikavyy, Andriy Y., Rooyackers, Rita, Verheyen, Peter, Leys, Frederik, Vellianitis, Georgios, Van Dal, Mark J., Lander, Rob, Loo, RogerVolume:
13
Year:
2008
Language:
english
DOI:
10.1149/1.2911514
File:
PDF, 642 KB
english, 2008