[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Effect of Annealing on Electronic Characteristics of HfSiON Films fabricated by Damascene Gate Process
Yamabe, Kikuo, Murata, Kouichi, Hayashi, Tomohiro, Tamura, T C., Sato, Motoyuki, Uedono, Akira, Shiraishi, Kenji, Umezawa, Naoto, Chikyow, Toyohiro, Watanabe, Heiji, Nara, Yasuo, Ohji, Yuzuru, MiyazakVolume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2981633
File:
PDF, 585 KB
english, 2008