Preparation and Characterization of Nanostructured TiN Thin...

Advanced Materials Research 2013 / 9 Vol. 770

Preparation and Characterization of Nanostructured TiN Thin Films Deposited by DC Reactive MagnetronSputtering

Buranawong, Adisorn, Saisereephap, Komgrit, Witit-Anun, Nirun, Kaewkhao, Jakrapong, Chaiyakun, Surasing
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Volume:
770
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.770.165
Date:
September, 2013
File:
PDF, 378 KB
english, 2013
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