Megasonic Cleaning to Remove Nano-Dimensional Contaminants...

Solid State Phenomena 2012 / 12 Vol. 195

Megasonic Cleaning to Remove Nano-Dimensional Contaminants from Wafer Surfaces: An Analytical Study

Nagarajan, R., Jain, S., Prabhudesai, M.A., Khanolkar, A., Reddy, M.P., Kumar, M.S., Vetrimurugan, R., Sundin, P., Thottathil, S., Goodson, M.J.
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Volume:
195
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.195.209
Date:
December, 2012
File:
PDF, 2.95 MB
english, 2012
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