Characterization of HfOxNy thin film formation by in-situ...

Applied Surface Science 2015 / 09 Vol. 349

Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

Lee, Young Bok, Oh, Il-Kwon, Cho, Edward Namkyu, Moon, Pyung, Kim, Hyungjun, Yun, Ilgu
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Volume:
349
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.05.066
Date:
September, 2015
File:
PDF, 1.64 MB
english, 2015
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