SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 17 August 2014)] Photonic Innovations and Solutions for Complex Environments and Systems (PISCES) II - Line-edge roughness and the impact of stochastic processes on lithography scaling for Moore's Law
Lakhtakia, Akhlesh, Todd, Judith A., Mack, Chris A.Volume:
9189
Year:
2014
Language:
english
DOI:
10.1117/12.2059929
File:
PDF, 831 KB
english, 2014