SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - New approach to improve LER of EUV resist pattern by chemical and thermal treatment
Wood, Obert R., Panning, Eric M., Nagahara, Tatsuro, Yamamoto, Kazuma, Matsuura, Yuriko, Sekito, TakashiVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2085713
File:
PDF, 923 KB
english, 2015