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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Multilevel step and flash imprint lithography for direct patterning of dielectrics
Jen, Wei-Lun, Palmieri, Frank, Chao, Brook, Lin, Michael, Hao, Jianjun, Owens, Jordan, Sotoodeh, Ken, Cheung, Robin, Willson, C. Grant, Lercel, Michael J.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711602
File:
PDF, 321 KB
english, 2007