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Chemical-Mechanical Polishing and Material Characteristics of Plasma-Enhanced Chemically Vapor Deposited Fluorinated Oxide Thin Films
Tseng, Wei-TsuVolume:
144
Year:
1997
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1837539
File:
PDF, 1.44 MB
english, 1997