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[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Annealing-temperature Dependence of Compositional Depth Profile and Chemical Structures of LaOx/ScOx/Si and ScOx/LaOx/Si Interfacial Transition Layer
Nohira, Hiroshi, Takenaga, Yoshinori, Kakushima, Kuniyuki, Ahmet, Parhat, Tsutsui, Kazuo, Iwai, H.Volume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2981599
File:
PDF, 7.38 MB
english, 2008