Dioxo–Fluoroalkoxide Tungsten(VI) Complexes for Growth of WO x Thin Films by Aerosol-Assisted Chemical Vapor Deposition
Bonsu, Richard O., Kim, Hankook, O’Donohue, Christopher, Korotkov, Roman Y., Abboud, Khalil A., Anderson, Timothy J., McElwee-White, LisaVolume:
54
Language:
english
Journal:
Inorganic Chemistry
DOI:
10.1021/acs.inorgchem.5b01124
Date:
August, 2015
File:
PDF, 9.41 MB
english, 2015