SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments
Hill, S. B., Faradzhev, N. S., Tarrio, C., Lucatorto, T. B., Madey, T. E., Yakshinskiy, B. V., Loginova, E., Yulin, S., Schellenberg, Frank M.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772627
File:
PDF, 647 KB
english, 2008