Polymorphs Discrimination of Nickel Silicides in Device...

Japanese Journal of Applied Physics 2007 / 6 Vol. 46; Iss. No. 22

Polymorphs Discrimination of Nickel Silicides in Device Structure by Improved Analyses of Low Loss Electron Energy Loss Spectrum

Asayama, Kyoichiro, Hashikawa, Naoto, Yamaguchi, Tadashi, Terada, Shohei, Mori, Hirotaro
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.L528
Date:
June, 2007
File:
PDF, 161 KB
english, 2007
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