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Reaction ergodography for silicon nitride bond formation by the nitridation of silicon dioxide
Tachibana, Akitomo, Kurosaki, Yuzuru, Fueno, Hiroyuki, Sera, Toshiaki, Yamabe, TokioVolume:
96
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100186a046
Date:
April, 1992
File:
PDF, 910 KB
english, 1992