Effect of Annealing with Ar Plasma Irradiation for...

Japanese Journal of Applied Physics 2009 / 8 Vol. 48; Iss. 8

Effect of Annealing with Ar Plasma Irradiation for Transparent Conductive Nb-Doped TiO 2 Films on Glass Substrate

Hojo, Mika, Okimura, Kunio
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.08HK06
Date:
August, 2009
File:
PDF, 206 KB
english, 2009
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