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A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer
Lim, Namsoo, Pak, Yusin, Kim, Jin Tae, Hwang, Youngkyu, Lee, Ryeri, Kumaresan, Yogeenth, Myoung, NoSoung, Ko, Heung Cho, Jung, Gun YoungVolume:
7
Year:
2015
Language:
english
Journal:
Nanoscale
DOI:
10.1039/C5NR02786A
File:
PDF, 2.50 MB
english, 2015