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Plasma-Damage-Induced Leakage Prevention Using Ozone Followed by SPM Solution Cleaning for Ion-Implanted Photoresist Strip
Mun, Seong Yeol, Shin, Kyeong Cheol, Choi, Woon Il, Kim, Jae Young, Kim, Dae Byung, Kang, Seong Jun, Jeong, Yang HeeVolume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2358859
File:
PDF, 201 KB
english, 2006