Formation and characterization of porous silicon films...

Materials Science in Semiconductor Processing 2015 / 12 Vol. 40

Formation and characterization of porous silicon films obtained by catalyzed vapor-chemical etching

Díaz-Torres, E., Romero-Paredes, G., Peña-Sierra, R., Ávila-García, A.
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Volume:
40
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2015.07.024
Date:
December, 2015
File:
PDF, 3.21 MB
english, 2015
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