Reactive Ion Etching as Cleaning Method Post Chemical...

Chinese Physics Letters 2008 / 02 Vol. 25; Iss. 2

Reactive Ion Etching as Cleaning Method Post Chemical Mechanical Polishing for Phase Change Memory Device

Min, Zhong, Zhi-Tang, Song, Bo, Liu, Song-Lin, Feng, Bomy, Chen
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Volume:
25
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/25/2/111
Date:
February, 2008
File:
PDF, 1.53 MB
english, 2008
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