SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Synthesis and lithographic performance of highly branched polymers from hydroxyphenylmethylcarbinols
Sounik, James R., Vicari, Richard, Lu, Ping-Hung, Kokinda, Elaine, Ficner, Stanley A., Dammel, Ralph R., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241817
File:
PDF, 876 KB
english, 1996