TiN Films Prepared by Flow Modulation Chemical Vapor...

Japanese Journal of Applied Physics 2001 / 3 Vol. 40; Iss. Part 1, No

TiN Films Prepared by Flow Modulation Chemical Vapor Deposition using TiCl 4 and NH 3

Hamamura, Hirotaka, Komiyama, Hiroshi, Shimogaki, Yukihiro
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.1517
Date:
March, 2001
File:
PDF, 380 KB
english, 2001
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