ECS Transactions [ECS China Semiconductor Technology International Conference 2010 (CSTIC 2010) - Shanghai, China (March 18 - March 19, 2010)] - 300mm Cu BEOL Top Trench Etch Process Development for 65nm Logic Technology
Ren, Wei, Song, Jeff, Liu, Andrew, Zhao, Ganming, Huang, Ying, Hsieh, Peter, Gu, Binxi, Wang, JudyYear:
2010
Language:
english
DOI:
10.1149/1.3360705
File:
PDF, 326 KB
english, 2010