In situ measurements of HCl during plasma etching of poly-silicon using a diode laser absorption sensor
Kim, Suhong, Klimecky, Pete, Jeffries, Jay B, Terry, Fred L, Hanson, Ronald KVolume:
14
Language:
english
Journal:
Measurement Science and Technology
DOI:
10.1088/0957-0233/14/9/318
Date:
September, 2003
File:
PDF, 371 KB
english, 2003