Reverse-contact UV nanoimprint lithography for multilayered structure fabrication
Kehagias, N, Reboud, V, Chansin, G, Zelsmann, M, Jeppesen, C, Schuster, C, Kubenz, M, Reuther, F, Gruetzner, G, Torres, C M SotomayorVolume:
18
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/18/17/175303
Date:
May, 2007
File:
PDF, 788 KB
english, 2007