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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Advanced electric-field scanning probe lithography on molecular resist using active cantilever
Resnick, Douglas J., Bencher, Christopher, Kaestner, Marcus, Aydogan, Cemal, Lipowicz, Hubert-Seweryn, Ivanov, Tzvetan, Lenk, Steve, Ahmad, Ahmad, Angelov, Tihomir, Reum, Alexander, Ishchuk, Valentyn,Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085846
File:
PDF, 3.79 MB
english, 2015