SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Development of spin-on metal hardmask (SOMHM) for advanced node
Wallow, Thomas I., Hohle, Christoph K., Yamada, Shintaro, Wang, Deyan, Chuang, Vivian, Liu, Cong, Wong, Sabrina, Clark, Michael B., Cutler, Charlotte, Williams, William, Baranowski, Paul, Li, Mingqi,Volume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2086005
File:
PDF, 1.36 MB
english, 2015