SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Durability of Ru-based EUV masks and the improvement
Wood, Obert R., Panning, Eric M., Lee, Suyoung, Kim, Jungyoup, Koh, Soo-Wan, Jang, Ilyong, Choi, Jaehyuck, Ko, Hyungho, Seo, Hwan-Seok, Kim, Seong-Sue, Kim, Byung Gook, Jeon, Chan-UkVolume:
9048
Year:
2014
Language:
english
DOI:
10.1117/12.2046556
File:
PDF, 6.60 MB
english, 2014