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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - A pattern- and optics-independent compact model of Mask3D under off-axis illumination with significant efficiency and accuracy improvements
Lai, Kafai, Erdmann, Andreas, Zhang, Hongbo, Yan, Qiliang, Wei, David, Croffie, EboVolume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2086046
File:
PDF, 1.88 MB
english, 2015