Reactive ion beam etching of fused silica using vertical...

Microelectronic Engineering 2015 / 06 Vol. 141

Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

Zajadacz, Joachim, Lorenz, Pierre, Frost, Frank, Fechner, Renate, Steinberg, Christian, Scheer, Hella-Christin, Zimmer, Klaus
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
141
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.04.032
Date:
June, 2015
File:
PDF, 1.59 MB
english, 2015
Conversion to is in progress
Conversion to is failed