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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - 32nm node technology development using interference immersion lithography
Sewell, Harry, McCafferty, Diane, Markoya, Louis, Hendrickx, Eric, Hermans, Jan, Ronse, Kurt, Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.601012
File:
PDF, 650 KB
english, 2005