Improvement in Magnetoresistance of Very Thin Permalloy...

Japanese Journal of Applied Physics 1994 / 9 Vol. 33; Iss. Part 2, No

Improvement in Magnetoresistance of Very Thin Permalloy Films by Post-Annealing

Funaki, Hiroshi, Okamoto, Satoshi, Kitakami, Osamu, Shimada, Yutaka
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1304
Date:
September, 1994
File:
PDF, 362 KB
1994
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