Local Bonding Structure of High-Stress Silicon Nitride Film...

Japanese Journal of Applied Physics 2007 / 4 Vol. 46; Iss. 4B

Local Bonding Structure of High-Stress Silicon Nitride Film Modified by UV Curing for Strained Silicon Technology beyond 45 nm Node SoC Devices

Miyagawa, Yoshihiro, Murata, Tatsunori, Nishida, Yukio, Nakai, Takehiro, Uedono, Akira, Hattori, Nobuyoshi, Matsuura, Masazumi, Asai, Koyu, Yoneda, Masahiro
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.1984
Date:
April, 2007
File:
PDF, 179 KB
english, 2007
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